◆ Manufacturer since 1990◆ Block A, 5th Research Institution, Zhengzhou, Henan, China
HNHONGXIANG
HNHONGXIANGSuperhard Materials
Application Hub · Grade Selection

Semiconductor & Electronics

From wafer slicing and lapping to CMP polishing and chamber cleaning.
Selection Guide

Diamond Grades For This Category

Process stepGrade directionSize range
Wafer slicing (wire saw)Nickel-coated HDY 56%6–12, 8–16, 10–20 µm
Wafer lapping & fine polishingMonocrystalline / polycrystalline micron0–1, 1–2, 2–4 µm
CMP pad conditioningMonocrystalline grit, sintered / brazed / electroplated80#–270# (50#–325#)
CMP slurryMono-, poly- and detonation nanodiamond0.5–60 µm full series
Chamber cleaning toolsHigh-purity demagnetised powder80#–400#
Selection Notes

How To Choose The Right Grade

  • Match the grade to the process step, not to the wafer size: slicing needs impact strength, CMP needs a narrow PSD and a low scratch count.
  • For CMP slurries ask for the full PSD curve and the metal-ion content — D50 alone does not predict scratch performance.
  • Nickel-coated grades lift retention in resin bond and electroplated wire; always specify coating weight as a percentage.
Inquiry

What To Include

Start from the application requirement. We will help narrow the grade, particle size and packing route.

1Wafer or substrate material and diameter
2Process step (slicing / lapping / CMP / cleaning)
3Target removal rate and surface finish (Ra)
4Bond system and coating preference
5Current defect or scratch issue

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